PlasmaQuant 9100 ICP-OES
Reveal the Details that Matter
- Maximum reliability – unique resolving power with high-resolution optics
- Convenient functionality – broad applicability and superior analytical performance
- Flexible observation – optimized plasma observation modes without compromises
- Increased productivity – Outstanding plasma robustness for analyzing any sample matrix
Add clarity, simplicity and confidence to your most delicate analytical routines
Experience superior analytical performance, application flexibility, robustness, and reliability with the optical emission spectrometer PlasmaQuant 9100. The high-resolution optics and exceptional matrix tolerance guarantee an efficient and uniquely sensitive analysis of geological samples, high-purity metals, chemical and petrochemical samples, as well as soils and industrial wastewater. In trace analysis of complex materials it is the sample that dictates your instrumental needs. High matrix contents require high plasma performance. Unique detection limits ask for a unique spectrometer design. The high-resolution ICP-OES technology makes unconditional confidence in your analytical results a reality.
Results you can rely on
The feasibility of trace analytics in highly concentrated samples by ICP-OES strongly depends on the instrumental plasma performance towards rapidly
varying sample types. Benefit from the widest working range as well as reduced sample preparation demands to improve precision, productivity and ease of use.
- Cost-efficient shift-work operation
- Flexible plasma observation
- Interference-free emission lines
- System readiness within 15 minutes
The unique resolving power of the high-resolution optics guarantees unmatched sensitivity, accuracy and precision in real sample matrices. In combination with the flexible Dual View PLUS plasma observation system, you can determine both trace and macro-elements with a single measurement. The intelligent torch design, in combination with the high-frequency generator, ensures a stable plasma performance for any sample matrix as well as for rapidly changing sample loads.
PlasmaQuant 9100 Series – Reveal the Details that Matter
Discover the new PlasmaQuant 9100 series by Analytik Jena. These ICP-OES devices offer superior analytical performance, application flexibility, robustness, and reliability – even for the most challenging sample matrices and applications.
PlasmaQuant 9100 ICP-OES
Choose the best model for your needs
Cost-effective analysis without compromise
With high-performance features, it allows for more matrix tolerance, a wide working range and high measurement sensitivity. It provides high-quality results in contract analysis, reliability in quality control and the highest standards in regulated industries.
PlasmaQuant 9100 Elite
Secrets revealed with high resolution
High spectral resolution: the extra that makes the difference in ICP-OES and unvocvers spectral details like no other instrument. Removing common spectral interferences minimizes compromises in line selection and allows the use of highly sensitive emission lines for every application. In combination with its matrix tolerance and superior sensitivity, this enables previously unconceived analytical potential.
|Manual PlasmaQuant 9100 | 9100 Elite (Edition 01.20, English)||PDF, 2 MB|
|Manual PlasmaQuant 9100 | 9100 Elite (Edition 01.20, German)||PDF, 2 MB|
|Manual PlasmaQuant 9100 | 9100 Elite (Edition 01.20, French)||PDF, 2 MB|
|Manual PlasmaQuant 9100 | 9100 Elite (Edition 01.20, Spanish)||PDF, 2 MB|
|Manual PQ 9000 (German)||PDF, 3 MB|
|Manual PQ 9000 (English)||PDF, 3 MB|
|Manual PQ 9000 (Spanish)||PDF, 4 MB|
|Manual PQ 9000 (French)||PDF, 9 MB|
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